Ohmic contacts to Gallium Nitride materials

Fig. 10 reports the values of the specific contact resistance ρ c as a function of the annealing temperature for Ni-based Ohmic contacts to p-type GaN, obtained by annealing processes in the temperature range between 400 and 550 °C, in oxidizing (air, O 2 or N 2 /O 2) or in neutral ambient (Ar or N 2). Two peculiar aspects can be deduced from ...

p-n Junctions: I-V Relationship

• Carrier equilibrium across the SCR determines n''(-x p) and p''(x n), the boundary conditions of the QNR minority carrier flow problems. p n Uniform p-type Uniform n-type-w p x-x p 0 x n w n Ohmic contact Ohmic contact A B i D + - v AB Quasineutral region I Quasineutral region II Space charge region Minority carrier flow here determines the ...

Ohmic Contact Engineering for Two-Dimensional Materials

Such doping scheme significantly lowers contact resistance and enables ohmic contacts for both p- and n-type Si FETs with high performance. 33. Basics of 2D/Metal Contacts. Compared with conventional Si, 2D materials are featured by the atomically flat surface that has extremely low density of dangling bonds or charges traps, making them ...

NbS2: A Promising p-Type Ohmic Contact for Two …

ing a robust p-type and Ohmic contact for NbS 2/BP and NbS 2/WSe 2 heterostructures. Comparative dipole analy-sis indicates sufficiently large work function is critical for the compensation of asymmetric interfacial dipole-induced work-function reduction to thus maintain the Ohmic con-tact. More importantly, the p-type Ohmic contacts in both

THE STUDY OF INTERNAL OHMIC TESTING IN …

INITIAL LEAD-ACID BATTERY DEFECTS Michael Nispel John Kim ... There was a clear correlation between internal ohmic readings and the degree of certain defects. Unfortunately, this study ... A further analysis of these test groups in regards to the type and degree of internal defect can be found in Section II. 15 - 4 0.9 0.95 1 1.05 1.1 1.15 1.2

Ohmic Contact to N

Electrical ohmic contacts can be simultaneously formed on silicon carbide (SiC) semiconductors having donor and acceptor impurities (n- and p-type doping, respectively). This implies that such contacts can be …

Ohmic Contacts to n-type GalnAsSb

LM-03K059 June 16,2003 Ohmic Contacts to n-type GaSb and n-type GalnAsSb R.K. Huang, C.A. Wang, C.T. Harris, M.K. Connors & D.A. Shiau NOTICE This report was prepared as an account of work sponsored by the United States Government. Neither the United States, nor the United States Department of Energy, nor any of their employees, nor any of their contractors, …

To achieve Ohmic contact on n-type Silicon, which metal(s) …

Si/Pd‐based contact schemes based on the solid‐phase regrowth (SPR) process have been developed to form low‐resistance ohmic contacts to n‐Al 0.5 In 0.5 P (E g =2.3 eV) with a minimum ...

Nanocrystal-based Ohmic contacts on n and p-type …

This is in contrast to methods that convert p-type contacts from Ohmic to rectifying in the process of forming an Ohmic contact on n-Ge by inserting a thin dielectric layer between the metal and Ge.

Ohmic contacts on n-type β-Ga2O3 using AZO/Ti/Au

AZO interlayers between n-Ga 2 O 3 and Ti/Au metallization significantly enhance Ohmic contact formation after annealing at ≥ 30 0 ° C. Without the presence of the AZO, similar anneals produce only rectifying …

(PDF) Near-Broken-Gap Alignment between FeWO 4 …

PDF | We report a near-broken-gap alignment between p-type FeWO4 and n-type Fe2WO6, a model pair for the realization of Ohmic direct junction... | Find, read and cite all the research you need on ...

A robust Ni/Au process and mechanism for p-type ohmic contact …

O 2 in the annealing atmosphere promoted the formation of p-type Ni 2 O 3 at the interface and Ga vacancies on the p-GaN surface, which effectively reduced the Schottky barrier height of metal/p-GaN, forming ohmic contacts. We believe that this study can pave the way for the preparation of GaN p-FET ohmic contacts.

Nanocrystal-based Ohmic contacts on n and p-type germanium

This is in contrast to methods that convert p-type contacts from Ohmic to rectifying in the process of forming an Ohmic contact on n-Ge by inserting a thin dielectric layer between the metal and Ge. Device simulations reinforce the observed decrease in tunneling resistance due to the enhanced electric field at the Ti-Au/Ge interface.

Characteristics of Ni-based ohmic contacts on n-type 4H-SiC …

The ohmic contact resistance of 4H-SiC samples is measured using a transmission-line-model structure. The nickel–silicon compound phase in both pulsed laser annealing (PLA) and rapid thermal annealing (RTA) samples is Ni 2 Si, which is confirmed by X-ray diffraction.. The elemental analysis results prove that PLA samples have more Ni 2 Si and …

P-type ohmic contacts of MBenes with MoS2 for nanodevices and …

We can obtain the Schottky barrier height from the band structure or partial density of states. If the VBM of MoS 2 in the heterostructure is close to the Fermi level, a p-type contact is formed. If the CBM approaches the Fermi level, an n-type contact is formed. If the VBM or CBM goes through the Fermi level, a p/n-type ohmic contact is formed.

Importance of layer distribution in Ni and Au based ohmic …

high quality ohmic contact on p-type GaN, using nickel (Ni) and gold (Au) thin layer association. Both the standard GaN/Ni/Au and its reverse, GaN/Au/Ni on p-type GaN were studied. The Au/Ni stack exhibits the most promising results in this study. While the standard Ni/Au contact exhibits a quasi-linear current-voltage (I-V) characteristic,

(PDF) Low-resistance p-type ohmic contacts for high-power …

The ohmic contacts to p-type GaAs formed by GaAs/Pt/Ti/Pt/Au systems were investigated. The specific contact resistance below 8× 10-7 Ωcdotcm2 was achieved when the interface Pt between GaAs ...

High-transparency Ni/Au ohmic contact to p -type GaN

In this study, a very thin Ni/Au bilayer metal film was prepared by electron beam evaporation and thermal alloying to form ohmic contact on p-type GaN film.After thermal alloying, the current–voltage (I–V) characteristic of Ni/Au contact on p-type GaN film exhibited ohmic behavior.The Ni/Au contacts showed a specific contact resistance of 1.7×10 −2 Ω cm …

Simultaneous Formation of Ni/Ti/Al/Ag Ohmic Contacts to both p

The ohmic contact characteristics can be evaluated by the contact resistance ρ c which is measured by C-TLM method. Experimental results show that the ohmic contact of both p-type …

n-Type Ohmic contact and p-type Schottky contact of …

Owing to their few lateral dangling bonds and enhanced gate electrostatics, two-dimensional semiconductors have attracted much attention for the fabrication of channels in next-generation field-effect transistors (FETs). Herein, combining …

Titanium disulfide as Schottky/ohmic contact for monolayer …

Unlike the n-type contacts, the p-type-doped TiS 2 –MoS 2 (ML) contacts shows zero barrier height when the p-type doping concentration reaches 5 × 10 18 cm −3.

A critical review of theory and progress in Ohmic contacts to p-type ...

An Ohmic contact is defined as having a linear symmetric current-voltage (I-V) relationship and negligible resistance between metal and semiconductor as compared with the bulk resistance of a device.Theoretically, the electrical properties of metal contacts to semiconductor are determined by the height and thickness of Schottky barrier at the interface.

Ohmic Contact Engineering for Two-Dimensional Materials

By increasing the illumination time, the MoTe 2 rapidly evolved from n-type to p-type transport behavior, showing great potential in fast and precise programmable doping of …

Investigation of Electrical and Interfacial Properties of Improved ...

Presented are the theoretical and experimental fundamentals of the fabrication of ohmic contacts to n- and p- type wide band gap semiconductors such as SiC and GaN.

Ni/W/Ni ohmic contacts for both n

3.1 Ohmic contact properties. Figure 3 shows the properties of the ohmic contacts formed with Ni, Ni/Ti/Ni, and Ni/W/Ni on n-type semiconductors. We confirmed that the ohmic contact characteristics were obtained for all annealing conditions. Also, we confirmed that high current flows with the same voltage levels when the annealing temperature is high.

Rational Construction of Heterostructures with n-Type Anti-Barrier ...

These n-type anti-barrier layers, generated by the ohmic contact between a quasi-metal (Co. EN. ... Furthermore, an aqueous battery device constructed with LCS cathode and Fe-Ni sulfide (FNS) anode demonstrates an impressive energy density of 118.5 Wh kg ...

n-Type Ohmic contact and p-type Schottky contact of …

A lateral n-type Schottky contact is generated with Sc, Au, Cr, Pt, Pd, and ML graphene electrodes owing to Fermi level pinning originating from the metal-induced gap states, which feature a pinning factor of 0.32. Luckily, a highly …

UW Nanotechnology Modeling Laboratory

There are two basic ways in which ohmic contacts can be formed: 1. Choose a system with < with an n-type semiconductor or > 4, with a p-type semiconductor. 2. Dope the semiconductor …

Low-resistance ohmic contacts on p-type GaN using Ni/Pd/Au ...

In this letter, a low-resistance ohmic contact on p-type GaN using an alloy of Ni/Pd/Au is reported.The Mg doped p-type GaN samples were grown by metalorganic chemical vapor deposition with a carrier concentration of 4.1×10 17 cm −3. The as-grown Mg doped samples were deposited with Ni (20 nm)/Pd (20 nm)/Au (100 nm) and then annealed in air, …

Ohmic Behavior in Metal Contacts to n/p-Type Transition-Metal ...

High contact resistance (RC) between 3D metallic conductors and single-layer 2D semiconductors poses major challenges toward their integration in nanoscale electronic devices. While in experiments the large RC values can be partly due to defects, ab initio simulations suggest that, even in defect-free structures, the interaction between metal and …

Ohmic contact

An ohmic contact is a region on a semiconductor device that has been prepared so that the current-voltage (I-V) curve of the device is linear and symmetric. If the I-V characteristic is non-linear and asymmetric, the contact can instead be termed a blocking or Schottky contact. Typical ohmic contacts on semiconductors are sputtered or evaporated metal pads that are patterned …

Ohmic contacts on n-type and p-type cubic silicon carbide (3C …

This paper is a report on Ohmic contacts on n-type and p-type type cubic silicon carbide (3C-SiC) layers grown on silicon substrates. In particular, the morphological, electrical and structural ...

Ni/W/Ni ohmic contacts for both n

We proposed and fabricated ohmic contact structure for 4H-SiC using Ni/Ti/Ni to provide low-resistive ohmic contacts with good thermal stability for both n-type and p-type …

Nanocrystal-based Ohmic contacts on n and p-type germanium

We report a simple method of forming Ohmic contacts to n and p-type germanium (Ge) simultaneously using Au nanocrystals embedded in Ti contact metal. The …

(PDF) Near-Broken-Gap Alignment between FeWO 4 and Fe 2 WO 6 for Ohmic ...

PDF | We report a near-broken-gap alignment between p-type FeWO4 and n-type Fe2WO6, a model pair for the realization of Ohmic direct junction... | Find, read and cite all the research you need on ...

Effects of thin heavily Mg-doped GaN capping layer on ohmic …

high-quality ohmic contact on n-type and p-type GaN is very important for the fabrication of such devices, especially for GaN-based lasers and avalanche photodiodes [3, 4]. For n-type GaN, it is easy to obtain low resistance ohmic contact (<10−5 cm2)byusingTi/Al, Ti/Au and Ti/Al/Ti/Au metal schemes. However, it is difficult to achieve such low

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